小Mask系列投影曝光机

Small Mask Series Projection Lithography Equipment

上海微电子装备（集团）股份有限公司（SMEE）

Shanghai Micro Electronics Equipment (Group) Co., Ltd. (SMEE)

SMEE小Mask系列投影曝光机，可应用于G2.5到G6基板的曝光制程，是面板制造的核心设备。本系列产品，采用6英寸或加长版掩模，实现在基板上低成本扫描曝光，满足多种屏幕制造需求。其中，对于4.5代及以下基板，采用专门的单掩模台、单物镜和单基板台架构机型进行曝光；对于5代和6代的基板，采用独创的双掩模台、双物镜和单基板台架构机型进行曝光。本系列产品已出货多台，并应用于国内研发线和量产线中。

SMEE small mask series projection lithography equipment is one of the key equipment for panel manufacturing, which can be used in the exposure process of G2.5 to G6 glass plates. This series adopt 6-inch or extended mask to realize low-cost scanning exposure and meet various display manufacturing requirements. Among them, special architecture of single mask stage, single projection lens and single plate stage is used for exposure of G4.5 plates and below; For the G5 and G6 plates, the innovative architecture of dual mask stages, dual projection lens and single plate stage is used for the exposure. This series have been shipped and widely applied to domestic R&D lines and mass production lines.

产品特点：

1. 采用6英寸或加长版掩模，显著降低设备的使用成本；

2. 采用1 : 2放大倍率物镜和扫描曝光技术，可增大曝光场提升产率；

3. 采用高精图像处理对准技术，可选配红外对准，工艺适应性强；

4. 二次预对准使用非接触光电测量技术，保证上片精度；

5. 独特的掩模颗粒度检测装置应用于设备中，保证生产良率。

Product Features:

1. The use of 6-inch or extended mask can significantly reduce the use cost of the equipment;

2. Adopting 1: 2 magnification projection lens and scanning exposure technology can increase the scan field size and help to improve the throughput;

3. High-precision image processing alignment technology is adopted, and infrared alignment is optional, with strong process adaptability;

4. Non-contact photoelectric measurement technology is used for secondary pre-alignment to ensure the accuracy of loading;

5. The unique mask particle size detection device is applied in the equipment to ensure the production yield.

产品参数：

Product Parameters：

请为我们投下宝贵的一票，谢谢！

Please vote for us, thank you!