短寸量测系列设备

Critical Dimension Measurement Series Equipment

上海微电子装备（集团）股份有限公司（SMEE）

Shanghai Microelectronics Equipment (Group) Co., LTD (SMEE)

短寸量测设备是监测黄光制程良率的关键设备。本产品利用光学原理，拍摄基板上指定位置的制程图形， 计算得出线宽CD（Critical Dimension）数据。同时，通过拍摄Mark标记，计算得出套刻OL（Overlay）数据。

Critical Dimension measurement series equipment t is the key equipment to monitor the yield of photolithography process. This product uses optical principles to capture process graphics at specified positions on the plate and calculate CD (Critical Dimension) data. At the same time, OL (Overlay) data can be also measured by photographing marks.

产品特点：

1. 采用自主开发的图像处理算法和高分辨率光机系统，实现精密测量；

2. 采用高精度高速运动台等技术，显著提升测量效率；

3. 采用图像调焦和焦面传感器调焦等技术，测量精度高，工艺适应性强；

4. 软硬件完全自主设计，可根据客户需求进行客制化开发。

Product Features:

1. Adopting self-developed image processing algorithm and high-resolution optical machine system to realize precision measurement;

2. Adopting high precision and high speed motion table and other technologies to significantly improve the measurement efficiency;

3. Using image analysis and focusing sensor technologies, with high measurement accuracy, and strong process adaptability;

4. The hardware and software are completely independently designed and can be customized according to customer needs.

产品参数：

Product Parameters:

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